Gasification System

ABSTRACT

A gasification system method and apparatus to convert a feed stream containing at least some organic material into synthesis gas having a first region, a second region, a gas solid separator, and a means for controlling the flow of material from the first region to the second region. The feed stream is introduced into the system, and the feed stream is partially oxidized in the first region thereby creating a solid material and a gas material. The method further includes the steps of separating at least a portion of the solid material from the gas material with the gas solid separator, controlling the flow of the solid material into the second region from the first region, and heating the solid material in the second region with an electrical means.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation-in-part of U.S. application Ser. No.11/432,826 filed May 12, 2006 for COMBINED GASIFICATION ANDVITRIFICATION SYSTEM, Examiner Matthew Merkling, Art Unit 1795, now U.S.Pat. No. ______ and U.S. application Ser. No. 12/008,956 filed Jan. 14,2008 for GRATE FOR HIGH TEMPERATURE GASIFICATION SYSTEMS, Examiner notyet assigned, Art Unit 1797, now U.S. Pat. No. ______.

TECHNICAL FIELD

This invention relates to methods and apparatus for gasifying materials.More specifically, this invention related to methods and apparatus foreconomically producing energy and responsibly disposing of wastematerial by gasifying and vitrifying waste material.

BACKGROUND OF THE INVENTION

There have been numerous examples of methods and apparatus forgenerating synthesis gas from waste materials. There have also beennumerous examples of methods and apparatus for generating synthesis gasfrom waste materials while vitrifying the inorganic portion of the wastematerials. These examples include systems described in US and foreignpatents that were designed and developed by the inventors and assigneeof the present invention as well as others.

Generally, all of these inventions have been designed to recoverchemical energy stored in the waste materials in a usable form,typically synthesis gas, either for use as a fuel for powering an engineor as a feedstock for some other chemical operation. Accordingly, it istypical that these systems are operated with some oxidant, such assteam, air, or pure oxygen, to generate synthesis gas from the organicportion of the waste feed stream.

It is also typical that these systems have the dual purpose of providinglong term safe storage of any hazardous inorganic portions of the wastematerials. Accordingly, many of these systems will be operated in amanner that results in the inorganic portion of the waste feed streamsbeing converted to a vitrified solid that will not leach hazardousconstituents into the ground or into aquifers. Among these systems, themost effective in achieving this objective have been systems that allowfor the introduction of energy, typically in the form of electricalenergy, which is used to process the waste feed streams. As a result,these systems are both producers and consumers of energy. Accordingly,increasing the efficiency in the operation of these systems is anobjective that those skilled in the art are always attempting toachieve.

Among these systems, it is also typical that the conversion of thesynthesis gas and the solid vitrified material be accompanied by theproduction of a number of materials that are not desired. Thesematerials include tars, oils, and carbon char that are typically foundin the synthesis gas stream. Minimizing the production of undesirabletars, oils, and carbon char is an objective that those skilled in theart are also always attempting to achieve.

Thus, there is a need for improved methods and apparatus for generatingsynthesis gas from waste materials that achieve any or all of thefollowing objectives: 1) provide greater efficiency in recoveringchemical energy stored in the waste materials in a usable form, 2)provide greater efficiency in forming inorganic portions of the wastematerials into a form suitable for long term safe storage of anyhazardous constituents, and 3) minimize the production of undesirabletars, oils, and carbon char in the synthesis gas.

The present invention achieves all of these objectives.

SUMMARY OF THE INVENTION

The present invention is a method and apparatus for converting a feedstream containing at least some organic material into synthesis gas. Inone aspect of the present invention, a gasification system is operatedto provide a method for converting a feed stream containing at leastsome organic material into synthesis gas. In this aspect of the presentinvention, an electrically heated gasification system having a firstregion, a second region, a gas solid separator, and a means forcontrolling the flow of material from the first region to the secondregion is provided. The feed stream is introduced into the system, andthe feed stream is partially oxidized in the first region therebycreating a solid material and a gas material. The method furtherincludes the steps of separating at least a portion of the solidmaterial from the gas material with the gas solid separator, controllingthe flow of the solid material into the second region from the firstregion, and heating the solid material in the second region with anelectrical means.

Another aspect of the present invention is a gasification system havinga first and a second region. Feedstocks are introduced into the firstregion where they are partially oxidized. Typically, while not meant tobe limiting, the feedstocks include waste materials having at least someorganic matter. These waste materials may include, but are not limitedto, solid waste as that term is defined under the Resource Conservationand Recovery Act (RCRA) Section 1004(27).

Typically, in a gasification system performing partial oxidationreactions, an effluent gas will be produced. Also typical for thesesystems, the effluent gas will contain solid materials. These solidmaterials include, without meaning to be limiting, oils, tars, and solidparticulate matter such as carbon char. One aspect of the presentinvention is that the relative abundance of these solid materials in theeffluent gas from the first region are reduced. To assist in achievingthis reduction, the first region includes a gas solid separator.

As used herein a “gas solid separator” includes any device or methodthat separates, in whole or in part, any portion of a solid particulatematerial entrained in a gas stream from that gas stream. While it may bedesirable to remove all of the solid particulate material from theeffluent gas, it may be impractical, difficult or impossible to do so.Accordingly, it is not necessary that the gas solid separator of thepresent invention remove all of the solid particulate material. Rather,to achieve the advantages of this aspect of the present invention, thegas solid separator must simply separate at least some of the solidmaterial, and thereby decrease the relative abundance of these solidmaterials in the effluent gas. As used herein a “gas solid separator”includes any device or method that is capable of providing thisseparation. While not meant to be limiting, it is preferred that the gassolid separator allow at least 50% of the gas from the first region tobe directed away from the second region through at least one primary gasduct. The effectiveness of directing the gas away from the second regioncan be maximized by placing the primary gas duct proximate to the meansof controlling flow from the first region to the second region.

The gasification system of the present invention further includes asecond region heated by an electrical means and a means for controllingthe rate of flow of the material from the first region into the secondregion. By providing the gas solid separator, the synthesis gas producedin the first region is cleaned and diverted away from the second region.In this manner, the energy consumption in the second region is minimizedwhile still producing a clean synthesis gas.

The gas solid separator may be positioned anywhere that will allow thegas solid separator to minimize the amount of gas that flows to thesecond region. Accordingly, the gas solid separator may be positioned ina variety of locations in the first region and still achieve thebenefits of the present invention. For example, and not meant to belimiting, the gas solid separator may be positioned between the secondregion and the means for controlling the rate of flow of the materialfrom the first region into the second region. As a further example, andalso not meant to be limiting, the gas solid separator may be positionedbefore the means for controlling the rate of flow of the material fromthe first region into the second region.

In certain embodiments of the present invention, the gasification systemmay also include a thermal residence chamber. The gas portion of thematerial produced in the first region of the present invention may thenbe routed to the thermal residence chamber. While not meant to belimiting, it is preferred that the step of heating the gas portion ofthe material in a thermal residence chamber is performed at a gastemperature at or above 1150° C. Also while not meant to be limiting, itis preferred that the gas portion of the material be maintained in thethermal residence chamber for an average residence time of at least 1second.

While not meant to be limiting, the thermal residence chamber mayfurther include a secondary ignition source in the thermal residencechamber. While not meant to be limiting, the secondary ignition sourcein the thermal residence chamber may be a plasma source.

The gas portion of the material produced in the first region of thepresent invention routed to the thermal residence chamber may be at orabove the autothermal temperature of the gas. Alternatively, the gasportion of the material routed to the thermal residence chamber may bebelow the autothermal temperature of the gas.

While not meant to be limiting, in circumstances where the gas portionof the material is routed to the thermal residence chamber, it ispreferred that the gas portion of the material routed to the thermalresidence chamber is partially oxidized in the thermal residence chamberby providing a second oxidant in the thermal residence chamber and/or asecondary ignition source in the thermal residence chamber. While notmeant to be limiting, the secondary ignition source in the thermalresidence chamber may be a plasma source, and the plasma source may beoperated intermittently, in a “pulse” mode.

In embodiments where a thermal residence chamber is provided, at leastone primary duct is provided that allows a gas flow between thegasification system and the thermal residence chamber. These primaryduct(s) may be positioned in a variety of locations that allow a gasflow between the first region and the thermal residence chamber.

For example, and not meant to be limiting, the gasification system mayinclude at least one primary gas duct between the first region and thethermal residence chamber positioned to allow gas flow through the meansfor controlling the rate of flow of the material from the first regioninto the second region.

As another example, and also not meant to be limiting, the gasificationsystem may include at least one primary gas duct between the firstregion and the thermal residence chamber positioned to allow gas flow tocircumvent the means for controlling the rate of flow of the materialfrom the first region into the second region.

As yet another example, and also not meant to be limiting, thegasification system may include a combination of both of the forgoingexamples, such that at least one primary gas duct between the firstregion and the thermal residence chamber is positioned to allow gas flowthrough the means for controlling the rate of flow of the material fromthe first region into the second region, and at least one primary gasduct between the first region and the thermal residence chamber ispositioned to allow gas flow to circumvent the means for controlling therate of flow of the material from the first region into the secondregion.

Either alone or in combination with the primary ducts, the gasificationsystem of the present invention may further include at least onesecondary gas duct allowing gas flow between the second region and thethermal residence chamber.

The gasification system of the present invention may further include atleast one primary oxidant port in the first region capable of allowingthe introduction of at least one oxidant into the first region.

The present invention may further include at least one secondary oxidantport. The secondary oxidant ports may be provided in a variety oflocations including, without limitation, one or more primary andsecondary ducts connecting the gasification system to the thermalresidence chamber, the thermal residence chamber, or combinationsthereof.

To assist in the partial oxidation reactions, suitable oxidants may beintroduced into the primary and secondary oxidant ports. Suitableoxidants include, but are not limited to, steam, mist, oxygen, air, andcombinations thereof.

Preferably, but not meant to be limiting, the means for controlling therate of flow of material is selected from the group of an active grate,an auger, a rake, an agitating grate, one or more rotating drums, apiston, and combinations thereof. More preferably, the means forcontrolling the rate of flow of material is an active grate as describedin co-pending U.S. patent application Ser. No. 12/008,956 filed Jan. 14,2008 entitled “GRATE FOR HIGH TEMPERATURE GASIFICATION SYSTEMS.”

Controlling the flow of the solid material into the second region fromthe first region may be performed by changing the space through whichmaterial passes in the active grate. The space through which thematerial passes may be changed, for example, according to a sensedparameter. The sensed parameter may be selected from temperature,composition of the gas, the rate of introduction of feedstock into thefirst region, and combinations thereof.

The electrical means for heating the second region of the gasificationsystem of the present invention is selected from the group jouleheating, plasma heating, and combinations thereof.

BRIEF DESCRIPTION OF THE DRAWINGS

The following detailed description of the embodiments of the inventionwill be more readily understood when taken in conjunction with thefollowing drawing, wherein:

FIG. 1 is an illustration of a simple form of the gas solid separatorused in the present invention.

FIG. 2 is an illustration of a preferred embodiment the presentinvention.

FIG. 3 is an overhead, partial cutaway view of the interior arrangementof refractory materials inside gas solid separator of a preferredembodiment of the present invention shown in FIG. 2.

FIG. 4 is a side cutaway view of the interior arrangement of refractorymaterials inside gas solid separator of a preferred embodiment of thepresent invention shown in FIG. 2.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

For the purposes of promoting an understanding of the principles of theinvention, reference will now be made to the embodiments illustrated inthe drawings and specific language will be used to describe the same. Itwill nevertheless be understood that no limitations of the inventivescope is thereby intended, as the scope of this invention should beevaluated with reference to the claims appended hereto. Alterations andfurther modifications in the illustrated devices, and such furtherapplications of the principles of the invention as illustrated hereinare contemplated as would normally occur to one skilled in the art towhich the invention relates.

FIG. 1 is an illustration of the gasification system 4 of the presentinvention showing a simple form of the gas solid separator 5 used in thepresent invention. While this example of the gas solid separator 5 isnot necessarily the preferred embodiment of this aspect of the presentinvention, it is useful to illustrate the range of possibilities forthis aspect of the present invention. As shown in FIG. 1, gasificationsystem 4 consists of a first region 1 connected to an active grate 3which is in turn connected to a second region 2. Materials areintroduced into first region 1 where they are partially oxidized. Solidmaterials from first region 1 are then transferred to second region 2through active grate 3.

Protruding from first region 1 is gas solid separator 5. As shown, gassolid separator 5 projects in a generally upward angle away from activegrate 3 and second region 2. Gas from first region 1 is flowed throughgas solid separator 5 and is thereby directed up and away from activegrate 3 and second region 2. Simultaneously, solid materials in the gasflow are pulled by gravity out of the gas flow, and are instead directedthrough active grate 3 and second region 2. In this manner, gas solidseparator 5 acts to separate solid materials entrained in the gas streamfrom the gas stream and to direct the gas away from region 2.Simultaneously, gas solid separator 5 acts to separate solid materialsentrained in the gas stream from the gas stream and to instead directthose materials through active grate 3 and into region 2.

FIG. 2 is an illustration of a preferred embodiment of the gasificationsystem 4 of the present invention. As shown in FIG. 2, gasificationsystem 4 consists of a first region 1 connected to a means forcontrolling the rate of flow of material, which could be an activegrate, an auger, a rake, an agitating grate, one or more rotating drums,a piston, and combinations thereof. As shown in the Figure, the means isan active grate 3 which is in turn connected to a second region 2.Materials are introduced into first region 1 where they are partiallyoxidized. The flow of solid materials in first region 1 are iscontrolled by active grate 3.

Just below active grate 3 is gas solid separator 5. As shown, gas solidseparator 5 has a conical shape projects in a generally downwarddirection connecting active grate 3 with second region 2. Solidmaterials are partially oxidized in first region 1, flow through activegrate 3, continue through gas solid separator 5, and are finallytransferred into second region 2. Accordingly, in this embodiment,active grate 3 and gas solid separator 5, may be considered as forming apart of first region 1.

In the embodiment shown in FIG. 2, (but not meant to be limiting), gassolid separator 5 has two primary gas ducts 6. The first primary gasduct 6 connects first region 1 and thermal residence chamber 7 at apoint above active grate 3. The second primary gas duct 6 connects firstregion 1 and thermal residence chamber 3 at a point below active grate3, at gas solid separator 5.

Gas from first region 1 is flowed through primary gas ducts 6 and isthereby directed away from second region 2. Simultaneously, solidmaterials are directed through gas solid separator 5 and into secondregion 2. The internal operation of gas solid separator 5 is not shownin FIG. 2, but is shown in FIGS. 3 and 4, and is described in greaterdetail below. In this manner, gas solid separator 5 acts to separatesolid materials entrained in the gas stream from the gas stream and todirect the gas away from region 2. Simultaneously, gas solid separator 5acts to separate solid materials entrained in the gas stream from thegas stream and to instead direct those solid materials into region 2.

At least one primary oxidant port 8 is provided in the first region 1.An oxidant is selected from the group of steam, mist, oxygen, air, andcombinations thereof may be introduced through this primary oxidant port8 to assist in the promotion of partial oxidation reactions.

At least one primary gas duct 6 is provided allowing gas flow betweenthe gasification system and the thermal residence chamber. Primary gasduct 6 may be positioned to allow gas flow directly between the firstregion 1 and the thermal residence chamber 7, or between the firstregion 1 and the thermal residence chamber 7 such that the gas flowsthrough the means for controlling the rate of flow of the material fromthe first region into the second region, shown in the figure as activegrate 3.

At least one secondary gas duct 10 is provided, allowing gas flowbetween the second region 2 and the thermal residence chamber 7.

At least one secondary oxidant port 11 is provided. As shown in thefigure, the secondary oxidant port 11 may be provided in the thermalresidence chamber 7, or in one or more of the primary and secondaryducts connecting the gasification system 4 to the thermal residencechamber 7.

An electrical means for heating the second region is provided. Thiselectrical means can be joule heating 12, plasma heating 13, andcombinations thereof. One or more drains 16 are provided to allow metalsand/or glass materials to be removed from second region 2.

An ignition source 14 may further be provided in the thermal residencechamber 7. This ignition source 14 may be a plasma source, and mayfurther be operated in a “pulse” mode, whereby power is intermittentlyprovided to the ignition source 14 so that a plasma is intermittentlyformed in the thermal residence chamber 7. In this manner, partialoxidation reactions are promoted within the thermal residence chamber 7.

Finally, during operation of the system 4, and particularly at startupand shut down of the system 4, the first region 1, second region 2, andthermal residence chamber 7, may heat and cool at different rates,thereby expanding and contracting at different rates. To accommodatedifferences in this expansion and contraction, expansion joints 9 may beprovided, and thermal residence chamber 7 may be mounted on a flexiblespring mount 15, to provide sufficient elasticity between the firstregion 1, the second region 2, and thermal residence chamber 7.

FIGS. 3 and 4 shows the interior arrangement of refractory Materialsinside gas solid separator 5 of the preferred embodiment shown in FIG.2. FIG. 3 presents an overhead, partial cutaway view, and FIG. 4presents a side, cutaway view. As shown in FIG. 3, the interior of gassolid separator 5 contains horizontal refractory 20, vertical refractory21, and shelf 23. As shown in FIGS. 3 and 4, horizontal refractory 20rests upon vertical refractory 21, which in turn rests upon the shelf23. To better illustrate the arrangement inside the gas solid separator5 of the preferred embodiment shown in FIG. 2, in FIG. 4, the left handside of FIG. 3 shows the horizontal refractory 20 as opaque, hiding thevertical refractory 21, and shelf 23. On the right hand side of FIG. 3,the horizontal refractory 20 has been removed, to better show thearrangement of vertical refractory 21, and shelf 23, and to show theinterstitial regions 22 through which gas may flow to exit the gas solidseparator 5 through primary gas duct 6.

As shown in FIG. 4, a ring of refractory material 26 is provided on topof horizontal refractory 20 to eliminate any gaps between adjacentbricks. Additionally, as those having ordinary skill in the art willrecognize, the ring of refractory material 26, horizontal refractory,vertical refractory 21 and shelf 23 may all be held in place withmortar.

The upper and lower portions of FIG. 3 shows a transparent view of thehorizontal refractory 20, the vertical refractory 21, and the shelf 23,allowing the viewer to better see the spatial relationship between eachof these elements. As a result of the arrangement of the horizontalrefractory 20 and vertical refractory 21, as solid and gaseous materialstravel downward through gas solid separator 5, solid materials areinclined to follow the direct, downward path toward the second region 2,as a result of their momentum and gravity. In contrast, gasses are moreinclined to flow through to the interstitial regions 22, and then toexit the gas solid separator 5 through primary gas duct 6. In thismanner, gas solid separator 5 effectively separates solid materials fromgasses, and flows a larger proportion of solid materials toward thesecond region 2, and a larger proportion of the gasses toward thermalresidence chamber 7.

While the invention has been illustrated and described in detail in thedrawings and foregoing description, the same is to be considered asillustrative and not restrictive in character. Only certain embodimentshave been shown and described, and all changes, equivalents, andmodifications that conic within the spirit of the invention describedherein are desired to be protected. Any experiments, experimentalexamples, or experimental results provided herein are intended to beillustrative of the present invention and should not be consideredlimiting or restrictive with regard to the invention scope. Further, anytheory, mechanism of operation, proof, or finding stated herein is meantto further enhance understanding of the present invention and is notintended to limit the present invention in any way to such theory,mechanism of operation, proof, or finding.

Thus, the specifics of this description and the attached drawings shouldnot be interpreted to limit the scope of this invention to the specificsthereof. Rather, the scope of this invention should be evaluated withreference to the claims appended hereto. In reading the claims it isintended that when words such as “a”, “an”, “at least one”, and “atleast a portion” are used there is no intention to limit the claims toonly one item unless specifically stated to the contrary in the claims.Further, when the language “at least a portion” and/or “a portion” isused, the claims may include a portion and/or the entire items unlessspecifically stated to the contrary. Likewise, where the term “input” or“output” is used in connection with an electric device or fluidprocessing unit, it should be understood to comprehend singular orplural and one or more signal channels or fluid lines as appropriate inthe context. Finally, all publications, patents, and patent applicationscited in this specification are herein incorporated by reference to theextent not inconsistent with the present disclosure as if each werespecifically and individually indicated to be incorporated by referenceand set forth in its entirety herein.

1) A gasification system comprising a first region where material isintroduced into the system and where the material may be partiallyoxidized, the first region including a gas solid separator; a secondregion heated by an electrical means, and a means for controlling therate of flow of material from the first region into the second region.2) The gasification system of claim 1 wherein the means for controllingthe rate of flow of material is selected from the group of an activegrate, an auger, a rake, an agitating grate, one or more rotating drums,a piston, and combinations thereof. 3) The gasification system of claim1 further comprising at least one primary oxidant port in the firstregion capable of allowing the introduction of at least one oxidant intothe first region. 4) The gasification system of claim 1 wherein the gassolid separator is positioned between the second region and the meansfor controlling the rate of flow of the material from the first regioninto the second region. 5) The gasification system of claim 1 furthercomprising a thermal residence chamber and at least one primary gas ductallowing gas flow between the gasification system and the thermalresidence chamber. 6) The gasification system of claim 5 wherein atleast one primary gas duct allows gas flow between the first region andthe thermal residence chamber. 7) The gasification system of claim 5wherein at least one primary gas duct between the first region and thethermal residence chamber is positioned to allow gas flow through themeans for controlling the rate of flow of the material from the firstregion into the second region. 8) (canceled) 9) The gasification systemof claim 5 further comprising at least one secondary gas duct allowinggas flow between the second region and the thermal residence chamber.10) The gasification system of claim 5 further comprising an ignitionsource in the thermal residence chamber. 11) The gasification system ofclaim 5 further comprising at least one secondary oxidant port. 12) Thegasification system of claim 11 wherein the secondary oxidant port isprovided in the thermal residence chamber. 13) The gasification systemof claim 11 wherein the secondary oxidant port is provided in one ormore primary and secondary ducts connecting the gasification system tothe thermal residence chamber. 14) The gasification system of claim 1wherein the electrical means for heating the second region is selectedfrom the group joule heating, plasma heating, and combinations thereof.15) The gasification system of claim 5 further comprising a plasmasource in the thermal residence chamber. 16) A method for converting afeed stream containing at least some organic material into synthesis gascomprising the steps of: providing electrically heated gasificationsystem having a first region, a second region, a gas solid separator,and a means for controlling the flow of material from the first regionto the second region; introducing the feed stream into the system;partially oxidizing the feed stream in the first region thereby creatinga solid material and a gas material; separating at least a portion ofthe solid material from the gas material with the gas solid separator;controlling the flow of the solid material into the second region fromthe first region; heating the solid material in the second region withan electrical means. 17) The method of claim 16 wherein the means forcontrolling the rate of flow of material is selected from the group ofan active grate, an auger, a rake, an agitating grate, one or morerotating drums, a piston, and combinations thereof. 18) The method ofclaim 16 further comprising the step of providing at least one oxidantto the first region. 19) The method of claim 17 wherein the oxidant isselected from the group of steam, mist, oxygen, air, and combinationsthereof. 20) The method of claim 16 wherein the gas solid separator isprovided as positioned between the second region and the means forcontrolling the rate of flow of the material from the first region intothe second region. 21) The method of claim 16 further comprising thestep of directing a portion of the gas material to a thermal residencechamber through at least one primary gas duct. 22) The method of claim21 wherein the step of directing the gas portion of the material to athermal residence chamber is performed at or above the autothermaltemperature of the gas. 23) The method of claim 21 further comprisingthe step of providing a secondary ignition source in the thermalresidence chamber. 24) The method of claim 21 wherein the step ofdirecting the gas portion of the material to the thermal residencechamber is performed below the autothermal temperature of the gas, andfurther including the step of partially oxidizing the gas by providing asecond oxidant in the thermal residence chamber. 25) The method of claim24 wherein the step of providing the second oxidant is through a portprovided in one or more ducts connecting the first region and the secondregion to the thermal residence chamber. 26) The method of claim 21wherein the step of directing the gas portion of the material to athermal residence chamber is performed at a gas temperature at or above1150° C. 27) The method of claim 21 wherein the gas portion of thematerial is maintained in the thermal residence chamber for an averageresidence time of at least 1 second. 28) The method of claim 16 whereinthe step of providing electrical heating in the second region is by amethod selected from the group joule heating, plasma heating, andcombinations thereof. 29) The method of claim 17 wherein the step ofcontrolling the flow of the solid material into the second region fromthe first region is performed by changing the space through whichmaterial passes in the active grate. 30) The method of claim 29 whereinthe space through which the material passes is changed according to asensed parameter. 31) The method of claim 30 wherein the where thesensed parameter is selected from temperature, composition of the gas,the rate of introduction of feedstock into the first region, andcombinations thereof. 32) The method of claim 16 wherein the gas solidseparator is provided as positioned between the second region and themeans for controlling the rate of flow of the material from the firstregion into the second region. 33) The method of claim 21 wherein atleast one of the primary gas ducts is provided between the first regionand the thermal residence chamber to allow gas flow through the meansfor controlling the rate of flow of the material. 34) The method ofclaim 21 wherein at least one primary gas duct is provided between thefirst region and the thermal residence chamber to allow gas flow fromthe first region to the thermal residence chamber to circumvent themeans for controlling the rate of flow of the material. 35) The methodof claim 21 further comprising the step of providing at least onesecondary gas duct allowing gas flow between the second region and thethermal residence chamber. 36) The method of claim 21 further comprisingthe step of minimizing the flow of gas from the first region to thesecond region by removal of gas through at least one primary gas duct.37) The method of claim 36 where the flow of gas flow from the firstregion to the second region is minimized by locating the primary gasduct proximate to the means to controlling the flow of solid materialfrom the first region to the second region 38) The method of claim 21further comprising the step of flowing at least 80% of the gas from thefirst region away from the second region through at least one primarygas duct. 39) The method of claim 21 further comprising the step ofproviding a plasma source in the thermal residence chamber. 40) Themethod of claim 39 further comprising the step of providing a plasmapulse in the thermal residence chamber. 41) A method for converting afeed stream containing at least some organic material into synthesis gascomprising the steps of: providing electrically heated gasificationsystem having a first region, a second region, and an active grate forcontrolling the flow of material from the first region to the secondregion introducing the feed stream into the system; partially oxidizingthe feed stream in the first region thereby creating a solid materialand a gas material; controlling the flow of the solid material into thesecond region from the first region by changing the area in the activegrate through which the solid material can flow; heating the solidmaterial in the second region with an electrical means. 42) The methodof claim 41 where the area in the active grate through which the solidmaterial is changed according to a sensed parameter. 43) The method ofclaim 41 where the amount of gas that passes through the active grate isminimized.